On January 14, 2024, SUNLUX appeared at the New York Retail Exhibition (NRF2024). The exhibition brought together outstanding enterprises from all over the world, to discuss the industry development trend. As a leader in the industry, SUNLUX demonstrated its leading advantages in technological innovation and market layout through this exhibition.

As the oldest and largest retail expo in the United States, NRF has become a platform to showcase the latest retail technologies, products and services. The exhibition area will reach 80,000 square meters, more than 30,000 professional visitors are expected to visit. At the same time, the number of exhibitors and participating brands will reach 700, covering China, Japan, South Korea, Italy, South Africa, Brazil, Spain and other countries and regions.

NRF is more than just a trade show, it's an industry community. Here, enterprises can form new partnerships, try first class experiences and learn from some of the biggest players transforming retail today. This is a rare opportunity for companies to exchange ideas with industry peers and jointly promote the development of the retail industry.

SUNLUX presented its latest products and solutions at the exhibition, newly designed products such as industrial barcode scanners, electronic labels and LCD screens are the highlights, These products and solutions are based on a deep understanding of market needs and the application of innovative technologies, bringing unprecedented user experience and business value to visitors.

At the exhibition site, Sunlux also conducted in-depth exchanges and discussions with many partners and customers. Through the interaction with industry peers, SUNLUX further understands the market demand and industry trends, providing a valuable reference for future product development and market expansion.

As a company with innovative spirit and market insight, SUNLUX will continue to maintain innovation momentum and launch more excellent products and solutions to meet the diversified needs of the market.